| Relevance of Course Objectives and Core Learning Outcomes(%) |
Teaching and Assessment Methods for Course Objectives |
| Course Objectives |
Competency Indicators |
Ratio(%) |
Teaching Methods |
Assessment Methods |
本課程介紹雷射直寫式黃光微影製程的原理及其應用於半導體製程圖案化之方法。期藉由本課程的修習讓學生充分了解各項設備的功能，進而活用於其研究工作。
This course introduces the principles of Laser Direct Write Lithography and its applications in semiconductor patterning processes. By completing this course, students will gain a comprehensive understanding of the functionalities of various equipment, enabling them to effectively apply these tools in their research work.
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| Written Presentation |
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| Internship |
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| Course Content and Homework/Schedule/Tests Schedule |
| Week |
Course Content |
| Week 1 |
雷射直寫式黃光微影製程
-黃光微影原理步驟
-元件圖形設計
-雷射直寫機台運用
-製程參數調控
Laser Direct Write Lithography Process
-Principles and Steps of Photolithography
-Component Design
-Operation of Laser Direct Write Systems
-Process Parameter Control
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self-directed
learning |
01.Participation in professional forums, lectures, and corporate sharing sessions related to industry-government-academia-research exchange activities.
03.Preparing presentations or reports related to industry and academia.
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| Evaluation |
| Attendance and Project Report |
| Textbook & other References |
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| Teaching Aids & Teacher's Website |
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| Sustainable Development Goals, SDGs(Link URL) |
| include experience courses：N |
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