| Relevance of Course Objectives and Core Learning Outcomes(%) |
Teaching and Assessment Methods for Course Objectives |
| Course Objectives |
Competency Indicators |
Ratio(%) |
Teaching Methods |
Assessment Methods |
原子力顯微鏡(Atomic Force Microscope, AFM)目前在半導體領域有著廣泛的應用,能夠提供完整奈米級的三維高分辨率的表面成像,並可進行微區域的納米尺度的機械、電性檢測。為半導體材料和元件的研究、設計和製造提供了納米級的精確度,並且能夠深入了解材料和元件的物理、電學和機械性質。
The Atomic Force Microscope (AFM) currently has widespread applications in the semiconductor field. It provides complete, high-resolution three-dimensional surface imaging at the nanoscale and enables mechanical and electrical measurements in micro-scale regions. AFM offers nanometer-level precision for the research, design, and manufacturing of semiconductor materials and devices, allowing for a deeper understanding of their physical, electrical, and mechanical properties.
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| Course Content and Homework/Schedule/Tests Schedule |
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Course Content |
| Week 1 |
1. 掃描探針顯微鏡(SPM)
2. 儀器原理及設備介紹
3. 原子力顯微鏡之掃描模式,接觸、輕敲、非接觸
4. 掃描參數之解說
數據處理及分析
1. Scanning Probe Microscopy (SPM)
2. Instrument Principles and Equipment Introduction
3. Scanning modes of Atomic Force Microscopy (AFM): Contact, Tapping, Non-Contact
4. Explanation of Scanning Parameters
5. Data Processing and Analysis |
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self-directed learning |
   01.Participation in professional forums, lectures, and corporate sharing sessions related to industry-government-academia-research exchange activities.    03.Preparing presentations or reports related to industry and academia.
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| include experience courses:N |
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