| Relevance of Course Objectives and Core Learning Outcomes(%) |
Teaching and Assessment Methods for Course Objectives |
| Course Objectives |
Competency Indicators |
Ratio(%) |
Teaching Methods |
Assessment Methods |
| 讓學生了解微製造工程之相關知識與產業應用 |
|
|
|
| Oral Presentation |
| Assignment |
| Quiz |
|
| Course Content and Homework/Schedule/Tests Schedule |
| Week |
Course Content |
| Week 1 |
Patterning by optical, X-Ray, and E-Beam lithography. |
| Week 2 |
Patterning by optical, X-Ray, and E-Beam lithography. |
| Week 3 |
Selective wet etching processes. |
| Week 4 |
Selective wet etching processes. |
| Week 5 |
Directional dry etching processes. |
| Week 6 |
Directional dry etching processes. |
| Week 7 |
Thin-film deposition by evaporation. |
| Week 8 |
Thin-film deposition by evaporation. |
| Week 9 |
Midterm Exam |
| Week 10 |
Sputtering, electroplating, chemical vapor deposition, and laser assisted deposition. |
| Week 11 |
Sputtering, electroplating, chemical vapor deposition, and laser assisted deposition. |
| Week 12 |
Bonding and release of mechanical structures. |
| Week 13 |
Bonding and release of mechanical structures. |
| Week 14 |
Bulk and surface micromachining for MEMS. |
| Week 15 |
Bulk and surface micromachining for MEMS. |
| Week 16 |
Future trends and development in MEMS technology. |
| Week 17 |
Self-directed learning
Project Report |
| Week 18 |
Self-directed learning
Project Report |
|
| Evaluation |
| Homework 10%, Oral Report 20%, Midterm Exams 30%, Final Exam 30% |
| Textbook & other References |
1. S. D. Senturia, Microsystem Design, 2001, Kluwer Academic Publishing.Required Text:
2. S. A. Campbell, “The Science and Engineering of Microelectronic Fabrication”, Oxford, 2001.
|
| Teaching Aids & Teacher's Website |
|
| Office Hours |
| 週二10:00-12:00, 週三15:00-17:00 |
| Sustainable Development Goals, SDGs |
| 04.Quality Education 08.Decent Work and Economic Growth 09.Industry, Innovation and Infrastructure | include experience courses：N |
|