NCHU Course Outline

Course Name	(中) 薄膜物理導論(3337)
	(Eng.) Introduction to Physics of Thin Films
Offering Dept	Department of Physics
Course Type	Elective	Credits	3	Teacher	KUMAR UTKARSH
Department	Department of Physics/Undergraduate	Language	English	Semester	2026-SPRING
Course Description	This course introduces undergraduate students to the fundamental concepts, materials, and processes of thin film technology, with an emphasis on physical understanding rather than advanced device engineering. The course bridges basic solid-state and semiconductor physics with practical thin-film fabrication techniques commonly used in microelectronics, optoelectronics, sensors, and energy devices. In addition to classroom lectures, the course includes hands-on exposure to sputtering and thin-film deposition systems, allowing students to connect theoretical concepts with real fabrication processes.
Prerequisites				self-directed learning in the course	Y

Relevance of Course Objectives and Core Learning Outcomes(%)			Teaching and Assessment Methods for Course Objectives
Course Objectives	Competency Indicators	Ratio(%)	Teaching Methods	Assessment Methods
Upon successful completion of this course, students will be able to:  Understand the physical principles underlying thin film growth and deposition.  Describe common thin film materials and their applications in modern technology  Explain vacuum technology and plasma-based deposition processes.  Understand sputtering mechanisms and key process parameters.  Perform basic thin film deposition experiments and analyze film properties.  Relate thin film structure and growth conditions to electrical and optical properties.			topic Discussion/Production Visit Exercises Discussion Lecturing	Written Presentation Attendance Assignment
Course Content and Homework/Schedule/Tests Schedule
Week Course Content Week 1 Introduction to Thin Film Technology: definition, historical development, applications in semiconductors, sensors, optics, and energy Week 2 Thin Film Materials: metals, semiconductors, and dielectrics; amorphous vs crystalline films Week 3 Substrates and Interfaces: substrate types, lattice mismatch, surface energy Week 4 Thin Film Growth Mechanisms: nucleation, island growth, layer-by-layer and Stranski–Krastanov modes Week 5 Vacuum Technology: vacuum systems, pumps, pressure regimes, mean free path Week 6 Physical Vapor Deposition (PVD): thermal evaporation and electron-beam evaporation Week 7 Sputtering Theory: DC and RF sputtering, plasma physics basics, sputtering yield Week 8 Hands-on Session I: Sputtering Deposition Week 9 Thin Film Thickness and Rate Control: quartz crystal monitor, deposition parameters Week 10 Chemical Vapor Deposition (CVD): basic principles and comparison with PVD Week 11 Thin Film Stress, Adhesion, and Defects Week 12 Electrical Properties of Thin Films: resistivity, sheet resistance, four-point probe concept Week 13 Optical Properties of Thin Films: transparency, absorption, basic interference effects Week 14 Hands-on Session II: Thin Film Characterization Week 15 Thin Film Applications: microelectronics, sensors, solar cells, coatings Week 16 Course Review and Final Assessment / Discussion self-directed learning    02.Viewing multimedia materials related to industry and academia.    03.Preparing presentations or reports related to industry and academia.
Evaluation
Attendance, Homework Assignments, Midterm Examination, Final Examination
Textbook & other References
 B. G. Streetman and S. Banerjee, Solid State Electronic Devices, Pearson.  S. M. Sze and K. K. Ng, Physics of Semiconductor Devices, Wiley.  C. Kittel, Introduction to Solid State Physics, Wiley.
Teaching Aids & Teacher's Website
Office Hours
Sustainable Development Goals, SDGs(Link URL)
04.Quality Education   09.Industry, Innovation and Infrastructure include experience courses：N

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Update Date, year/month/day：2026/01/09 15:33:43	Printed Date, year/month/day：2026 / 3 / 10
The second-hand book website：http://www.myub.com.tw/