國立中興大學教學大綱

課程名稱	(中) 薄膜物理導論(3337)
	(Eng.) Introduction to Physics of Thin Films
開課單位	物理系
課程類別	選修			學分	3	授課教師	王雷
選課單位	物理系 / 學士班			授課使用語言	英文	英文/EMI	Y	開課學期	1142
課程簡述	This course introduces undergraduate students to the fundamental concepts, materials, and processes of thin film technology, with an emphasis on physical understanding rather than advanced device engineering. The course bridges basic solid-state and semiconductor physics with practical thin-film fabrication techniques commonly used in microelectronics, optoelectronics, sensors, and energy devices. In addition to classroom lectures, the course includes hands-on exposure to sputtering and thin-film deposition systems, allowing students to connect theoretical concepts with real fabrication processes.
先修課程名稱

課程與核心能力關聯配比(%)			課程目標之教學方法與評量方法
課程目標	核心能力	配比(%)	教學方法	評量方法
Upon successful completion of this course, students will be able to:  Understand the physical principles underlying thin film growth and deposition.  Describe common thin film materials and their applications in modern technology  Explain vacuum technology and plasma-based deposition processes.  Understand sputtering mechanisms and key process parameters.  Perform basic thin film deposition experiments and analyze film properties.  Relate thin film structure and growth conditions to electrical and optical properties.			專題探討/製作 參訪 習作 討論 講授	書面報告 出席狀況 作業
授課內容(單元名稱與內容、習作/每週授課、考試進度-共16週加自主學習)
週次 授課內容 第1週 Introduction to Thin Film Technology: definition, historical development, applications in semiconductors, sensors, optics, and energy 第2週 Thin Film Materials: metals, semiconductors, and dielectrics; amorphous vs crystalline films 第3週 Substrates and Interfaces: substrate types, lattice mismatch, surface energy 第4週 Thin Film Growth Mechanisms: nucleation, island growth, layer-by-layer and Stranski–Krastanov modes 第5週 Vacuum Technology: vacuum systems, pumps, pressure regimes, mean free path 第6週 Physical Vapor Deposition (PVD): thermal evaporation and electron-beam evaporation 第7週 Sputtering Theory: DC and RF sputtering, plasma physics basics, sputtering yield 第8週 Hands-on Session I: Sputtering Deposition 第9週 Thin Film Thickness and Rate Control: quartz crystal monitor, deposition parameters 第10週 Chemical Vapor Deposition (CVD): basic principles and comparison with PVD 第11週 Thin Film Stress, Adhesion, and Defects 第12週 Electrical Properties of Thin Films: resistivity, sheet resistance, four-point probe concept 第13週 Optical Properties of Thin Films: transparency, absorption, basic interference effects 第14週 Hands-on Session II: Thin Film Characterization 第15週 Thin Film Applications: microelectronics, sensors, solar cells, coatings 第16週 Course Review and Final Assessment / Discussion 自主學習 內容    02.閱覽產業及學術相關多媒體資料    03.製作專題報告
學習評量方式
Attendance, Homework Assignments, Midterm Examination, Final Examination
教科書＆參考書目(書名、作者、書局、代理商、說明)
 B. G. Streetman and S. Banerjee, Solid State Electronic Devices, Pearson.  S. M. Sze and K. K. Ng, Physics of Semiconductor Devices, Wiley.  C. Kittel, Introduction to Solid State Physics, Wiley.
課程教材（教師個人網址請列在本校內之網址）
課程輔導時間
聯合國全球永續發展目標(連結網址)
04.教育品質   09.工業、創新基礎建設 提供體驗課程：N

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更新日期 西元年/月/日：2026/01/09 15:33:43	列印日期 西元年/月/日：2026 / 1 / 09
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